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Under-bump Metallization (UBM) Control using X-ray Fluorescence (XRF)

Authors :
Dileep Agnihotri
Dave Brown
Joseph Imhof
Jeremy O'Dell
Alex Tokar
David G. Seiler
Alain C. Diebold
Robert McDonald
C. Michael Garner
Dan Herr
Rajinder P. Khosla
Erik M. Secula
Source :
AIP Conference Proceedings.
Publication Year :
2007
Publisher :
AIP, 2007.

Abstract

Energy dispersive x‐ray fluorescence is a powerful technique for measurement of film thickness as well as compositions. As chip packaging is becoming part of typical Fab process, additional multilayer stack films are used for re‐distribution of bumps and under bump metallization. These re‐distribution and under‐bump film stacks are characterized using XRF. In addition, composition of lead‐free Ag/Sn bump is also measured using small spot x‐ray fluorescence.

Details

ISSN :
0094243X
Database :
OpenAIRE
Journal :
AIP Conference Proceedings
Accession number :
edsair.doi...........7e28fd99a379eb97f2e8b487c60ab240