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Direct TEM study of the roughening of SiO2/Si interface induced during AES depth profiling

Authors :
P. B. Barna
M. Rasigni
L. Gosztola
A. Zalar
Source :
Surface and Interface Analysis. 9:328-328
Publication Year :
1986
Publisher :
Wiley, 1986.

Subjects

Subjects :
Materials science
business.industry
Materials Chemistry
Profiling (information science)
Optoelectronics
Surfaces and Interfaces
General Chemistry
Condensed Matter Physics
business
Surfaces, Coatings and Films

Details

ISSN :
10969918 and 01422421
Volume :
9
Database :
OpenAIRE
Journal :
Surface and Interface Analysis
Accession number :
edsair.doi...........7cabfa3ee2c1ec8833cee421264f501c
Full Text :
https://doi.org/10.1002/sia.740090512
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