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Anisochemical Homopolymer/Diblock Copolymer Thin Film Blends
- Source :
- Macromolecules. 32:8392-8398
- Publication Year :
- 1999
- Publisher :
- American Chemical Society (ACS), 1999.
-
Abstract
- We examined the effect of the addition of homopolymers tetramethylbisphenol A polycarbonate, TMPC, and poly(norbornene−methyl-d3-carboxylate), NBMC, on the interlamellar spacing and the phase stability of symmetric poly(styrene-b-methyl methacrylate) diblock copolymer thin films on silicon substrates. The films were of thickness h, L 0.2 the morphology of the diblock copolymer changed to accommodate higher volume fractions of TMPC. This behavior is contrasted with earlier observations in the PS-b-PMMA/PS homopolymer system wher...
- Subjects :
- Morphology (linguistics)
Materials science
Polymers and Plastics
Silicon
Organic Chemistry
chemistry.chemical_element
Methacrylate
Inorganic Chemistry
chemistry
Chemical engineering
visual_art
Polymer chemistry
Materials Chemistry
visual_art.visual_art_medium
Copolymer
Lamellar structure
Polymer blend
Polycarbonate
Thin film
Subjects
Details
- ISSN :
- 15205835 and 00249297
- Volume :
- 32
- Database :
- OpenAIRE
- Journal :
- Macromolecules
- Accession number :
- edsair.doi...........7bf6578a0c3569a64a57cb550ca1cddc