Effects of Ni implantation into bulk and epitaxial GaP on structural and magnetic characteristics

Authors :: S. N. G. Chu
M. E. Overberg
C. R. Abernathy
J. M. Zavada
Stephen J. Pearton
Robert G. Wilson
Nikoleta Theodoropoulou
Arthur F. Hebard
Source :: Materials Science and Engineering: B. 94:14-19
Publication Year :: 2002
Publisher :: Elsevier BV, 2002.
Abstract: Structural and magnetic characteristics of Ni-implanted GaP were measured for doses in the range 3/5/10 16 cm 2 . After subsequent annealing at 700 8C, transmission electron microscopy (TEM) showed residual lattice damage which was more significant in highly carbon-doped epi layers as compared to bulk GaP substrates. The magnetization measurements showed two different contributions, one present at 5/75 K and the other below � /225 K. No secondary phase formation was detected in either type of GaP. # 2002 Elsevier Science B.V. All rights reserved.

Subjects :: Materials science
Band gap
Annealing (metallurgy)
business.industry
Mechanical Engineering
Doping
Analytical chemistry
Condensed Matter Physics
Epitaxy
Magnetization
Crystallography
Semiconductor
Ferromagnetism
Mechanics of Materials
Transmission electron microscopy
General Materials Science
business

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