A model for thickness effect on the band gap of amorphous germanium film

A Mott-Davis-Paracrystalline model was proposed to interpret thickness effect of the band gap for amorphous germanium (a-Ge). We believe that a-Ge has a semiconductor-alloy-like structure, it may contain medium-range order (MRO) and continuous random network (CRN) simultaneously and there is a dependence of MRO/CRN ratio on film thickness and preparation methods/parameters. For MRO is dominant, thickness effect can be described by one-dimensional quantum confinement (ODQC) effect of nanocrystals and strain-induced shrinkage of the band gap; For CRN is dominant, thickness dependence can be interpreted by changes in the quality of a CRN and ODQC effect of nanoamorphous phase.