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Underpotential Deposition of Lead on Cu(100) in the Presence of Chloride: Ex-Situ Low-Energy Electron Diffraction, Auger Electron Spectroscopy, and Electrochemical Studies
- Source :
- Langmuir. 13:2390-2397
- Publication Year :
- 1997
- Publisher :
- American Chemical Society (ACS), 1997.
-
Abstract
- Electrochemical and ultrahigh vacuum measurements are presented for the underpotential deposition (UPD) of Pb on Cu(100) in the presence of chloride ions. The chemistry is very similar to that for ...
- Subjects :
- Auger electron spectroscopy
Low-energy electron diffraction
Chemistry
Analytical chemistry
chemistry.chemical_element
Surfaces and Interfaces
Condensed Matter Physics
Electrochemistry
Underpotential deposition
Chloride
Copper
Transition metal
Electron diffraction
medicine
General Materials Science
Spectroscopy
medicine.drug
Subjects
Details
- ISSN :
- 15205827 and 07437463
- Volume :
- 13
- Database :
- OpenAIRE
- Journal :
- Langmuir
- Accession number :
- edsair.doi...........7af3d5cc44d875f79c3a55d8b62025ea
- Full Text :
- https://doi.org/10.1021/la960999x