Thin-film deposition of (Ba/sub x/Sr/sub 1-x/)TiO/sub 3/ by pulsed ion beam evaporation

Authors :: Kiyoshi Yatsui
K. Ohtomo
Weihua Jiang
T. Sonegawa
Source :: IEEE Transactions on Plasma Science. 28:1545-1548
Publication Year :: 2000
Publisher :: Institute of Electrical and Electronics Engineers (IEEE), 2000.
Abstract: An ablation plasma generated by intense, pulsed ion beam was used for thin-film deposition of commercially interesting material (Ba/sub x/,Sr/sub 1-x/)TiO/sub 3/ (0

Subjects :: Nuclear and High Energy Physics
Materials science
Ion beam
X-ray photoelectron spectroscopy
Scanning electron microscope
Analytical chemistry
Substrate (electronics)
Dielectric
Thin film
Condensed Matter Physics
Evaporation (deposition)
Deposition (chemistry)

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