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Use of electrodeposition for sample preparation and rejection rate prediction for assay of electroformed ultra high purity copper for 232Th and 238U prior to inductively coupled plasma mass spectrometry (ICP/MS)
- Source :
- Journal of Radioanalytical and Nuclear Chemistry. 277:103-110
- Publication Year :
- 2008
- Publisher :
- Springer Science and Business Media LLC, 2008.
-
Abstract
- The search for neutrinoless double beta decay in 76Ge has driven the need for ultra-low background Ge detectors shielded by electroformed copper of ultra-high radiopurity (
- Subjects :
- Chemistry
Health, Toxicology and Mutagenesis
Radiochemistry
Public Health, Environmental and Occupational Health
Thorium
chemistry.chemical_element
Uranium
Pollution
Copper
Analytical Chemistry
Nuclear Energy and Engineering
Plating
Electroforming
Radiology, Nuclear Medicine and imaging
Sample preparation
Electroplating
Inductively coupled plasma mass spectrometry
Spectroscopy
Subjects
Details
- ISSN :
- 15882780 and 02365731
- Volume :
- 277
- Database :
- OpenAIRE
- Journal :
- Journal of Radioanalytical and Nuclear Chemistry
- Accession number :
- edsair.doi...........7abf16e229845f290b46bcd3910c3926