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Simple method for fabrication of diamond nanowires by inductively coupled plasma reactive ion etching
- Source :
- Japanese Journal of Applied Physics. 56:058005
- Publication Year :
- 2017
- Publisher :
- IOP Publishing, 2017.
-
Abstract
- Diamond nanowires are fabricated on a bulk, single crystalline diamond near an edge of aluminum coating using inductively coupled plasma reactive ion etching. Two different density areas are simultaneously appeared where the dense area has 9 times higher density than that of the sparse area while keeping the size of nanowires almost uniform in these areas. The nanowire sizes realized in the dense (sparse) area are 858 ± 22 nm (876 ± 25 nm) in height and 126 ± 6 nm (124 ± 7 nm) in diameter, which is suitable for applications in optical quantum information processing.
- Subjects :
- SIMPLE (dark matter experiment)
Fabrication
Materials science
Physics and Astronomy (miscellaneous)
General Engineering
Analytical chemistry
Nanowire
General Physics and Astronomy
Diamond
02 engineering and technology
Edge (geometry)
engineering.material
021001 nanoscience & nanotechnology
01 natural sciences
010309 optics
Aluminum coating
0103 physical sciences
engineering
Reactive-ion etching
Inductively coupled plasma
0210 nano-technology
Subjects
Details
- ISSN :
- 13474065 and 00214922
- Volume :
- 56
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........7a7e22baca917b325cedf7605de39f12