Progress on sub-wavelength nanoimaging with a coherent tabletop EUV source (Conference Presentation)

Authors :: Henry C. Kapteyn
Michael Tanksalvala
Bin Wang
Yuka Esashi
Christina L. Porter
Peter Johnsen
Charles S. Bevis
Robert Karl
Source :: Metrology, Inspection, and Process Control for Microlithography XXXIII.
Publication Year :: 2019
Publisher :: SPIE, 2019.

Subjects :: Physics
Presentation
Quantitative imaging
Optics
business.industry
Extreme ultraviolet lithography
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High harmonic generation
High numerical aperture
business
Ptychography
Sub wavelength
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Database :: OpenAIRE
Journal :: Metrology, Inspection, and Process Control for Microlithography XXXIII
Accession number :: edsair.doi...........79e40516855fa9fdb212b1f4ca4d86e8

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