Effect of Pressure Pulsation on Post-Etch Photoresist Stripping on Low-k Films in Supercritical CO2

Authors :: Koichiro Saga
Koya Saito
I. Mizobata
Hitoshi Kuniyasu
Takeshi Hattori
H. Kiyose
S. Hirae
Tatsuya Iwata
Source :: Solid State Phenomena. 134:341-344
Publication Year :: 2007
Publisher :: Trans Tech Publications, Ltd., 2007.

Subjects :: Materials science
Chemical engineering
Analytical chemistry
General Materials Science
Photoresist
Condensed Matter Physics
SU-8 photoresist
Stripping (fiber)
Atomic and Molecular Physics, and Optics
Supercritical fluid

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