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Effect of annealing on the structures and properties of Al and F co-doped ZnO nanostructures

Authors :
Yonghao Xiao
Guanghui Hu
Xinlong Tian
Zhigang Wei
Chumin Xiao
Chun Chen
Zhanchang Pan
Shoukun Wu
Jianfeng Deng
Source :
Materials Science in Semiconductor Processing. 17:162-167
Publication Year :
2014
Publisher :
Elsevier BV, 2014.

Abstract

Al–F co-doped ZnO (AFZO) nanocrystals were successfully synthesized onto glass substrates by the sol–gel method and the structure and morphology of the films as a function of annealing temperature were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The results indicated that all the films were polycrystalline with a hexagonal wurtzite structure and exhibited a c-axis preferred orientation. The XPS study confirmed that co-doping ions are successfully incorporated into the ZnO nanostructure. AFZO thin films annealed at 500 °C exhibited the lowest resistivity due to the higher carrier concentration and mobility. The knowledge acquired in this work is important for the AFZO thin films with applications in optoelectronic devices.

Details

ISSN :
13698001
Volume :
17
Database :
OpenAIRE
Journal :
Materials Science in Semiconductor Processing
Accession number :
edsair.doi...........787ffb4904c620245e0578951ab24cbd
Full Text :
https://doi.org/10.1016/j.mssp.2013.09.023