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Characterisation of Epoxy Resins for Microstereolithographic Rapid Prototyping

Authors :
Chris Chatwin
Malcolm I. Heywood
Rupert Young
Maria Farsari
Philip Birch
John D. Richardson
Frederic Claret-Tournier
S Huang
Source :
The International Journal of Advanced Manufacturing Technology. 15:281-286
Publication Year :
1999
Publisher :
Springer Science and Business Media LLC, 1999.

Abstract

Two epoxy resins are investigated using non-degenerate four-wave mixing. The materials assessed are optimised for use with a UV argon-ion laser. The holographic gratings were written at a wavelength of λ = 351.1 nm for an irradiance range 0.5-3.0 W/cm 2 and read at λ = 632.8 nm in order to compare the reactivity, curing speed, shrinkage and resolution of the resins. These experiments were carried out to prove the suitability of the photopolymerisation systems for use with a new microstereolithographic technique. This new technique exploits a spatial light modulator to create 3D components using a completely planer, layer-by-layer, process of exposure which is described herein. With this procedure it is possible to build components with dimensions in the range of 50 mm to 50 μm, and feature sizes as small as 5 μm with a resolution of 1 μm.

Details

ISSN :
14333015 and 02683768
Volume :
15
Database :
OpenAIRE
Journal :
The International Journal of Advanced Manufacturing Technology
Accession number :
edsair.doi...........7618330e46a229484bda40e54e17a88b
Full Text :
https://doi.org/10.1007/s001700050067