Electron beam tool/resist interdependence

The contribution of an electron beam exposure tool to positive resist profiles has been investigated experimentally and with two‐ and three‐dimensional modelling. Listed in decreasing importance are: spot placement error > beam defocus > beam tilt (trapezoidal energy distribution across and/or down the length of a line in the resist) > beam noise (variation of energy from spot to spot down the length of a resist line, as well as Gaussian noise within the same spot). These tool contributions to resist profile have been characterized in two resists: a linear PMMA derivative and a highly nonlinear novolac resist that exhibits a long induction time before developing.