Characterization of Deposited Materials Formed by Focused Ion Beam-Induced Chemical Vapor Deposition Using AuSi Alloyed Metal Source

In this paper deposited materials using focused ion beam-induced chemical vapor deposition (FIB-CVD) in an AuSi alloyed metal source was investigated. Results using Au and Si FIB-CVD were almost the same as those using Ga FIB-CVD. It was suggested that differences in deposited materials among the ions used should be investigated in more detail.