Threshold Voltage Tuning in Multilayer MoS2 Transistors via Fluorine-Based Plasma Treatment

Authors :: Junseok Heo
So Hyeon Kim
Min Suk Oh
Geonwook Yoo
Youngseo Park
Jiyeon Ma
Young Woo Joo
Source :: Science of Advanced Materials. 10:1427-1430
Publication Year :: 2018
Publisher :: American Scientific Publishers, 2018.

Subjects :: Materials science
chemistry
law
business.industry
Transistor
Fluorine
Optoelectronics
chemistry.chemical_element
General Materials Science
Plasma treatment
business
law.invention
Threshold voltage

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