A review of quantum dot solar cells fabrication via chemical vapor deposition method

Quantum Dots (QDs) are proficient in increasing the efficiency of solar cells due to their property of multiple exciton generation (electron-hole pairs) after the collision with a single photon of energy exceeding the size of the bandgap. These nanostructures can be synthesized by the bottom-up approach in which Chemical Vapor Deposition (CVD) technology offers great benefits of high throwing power and provides a cost-effective solution for large scale fabrication. The different types of CVD methods used in the fabrication process are discussed here for example - Plasma chemical vapor deposition (PCVD) is a technique in which various precursors can be used; reactive organic and inorganic materials undergo disintegration and radical polymerization while being exposed to a high-energy plasma stream for depositing a thin film over the surface of the substrate at a relatively lower temperature. In Metal-organic chemical vapor deposition (MOCVD) volatile organo-metallic precursors are deposited on the surface of the substrate under vacuum. Hot-wire chemical vapor deposition process (HWCVD) is a technique that involves the thermal deposition of precursor gases on the substrate. Some of the recent researches highlighting the fabrication of Quantum Dot Solar Cells (QDSC) and enhancing their properties for achieving high solar energy conversion efficiency using CVD methods have been discussed. Surface properties of these deposited films by CVD have been analyzed using several techniques which are discussed here. At last, challenges faced in the fabrication of QDSC are discussed and the areas of improvement and future outlook of solar cells are suggested.