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Summary Abstract: Reaction and epitaxy at the Co/Si(111) interface

Authors :
S. B. Anderson
M. W. Ruckman
H. W. Chen
John J. Joyce
J. H. Weaver
S. A. Chambers
Federico Boscherini
Source :
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 5:2142-2143
Publication Year :
1987
Publisher :
American Vacuum Society, 1987.

Subjects

Subjects :
Materials science
business.industry
Interface (Java)
Optoelectronics
Surfaces and Interfaces
Condensed Matter Physics
business
Epitaxy
Surfaces, Coatings and Films

Details

ISSN :
15208559 and 07342101
Volume :
5
Database :
OpenAIRE
Journal :
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Accession number :
edsair.doi...........726a75e22ce3beeedffc3ca375efed30
Full Text :
https://doi.org/10.1116/1.574938
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