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Preparation of fluorocarbon thin film deposited by soft X-ray ablation and its electrical characteristics and thermal stability
- Source :
- Applied Surface Science. 252:7774-7780
- Publication Year :
- 2006
- Publisher :
- Elsevier BV, 2006.
-
Abstract
- Fluorocarbon films were deposited by soft X-ray ablation of polytetrafluoroethylene (PTFE) and characterized as low-dielectric-constant interlayer dielectrics. Very rapid deposition of such films at approximately 1500 nm/min could be achieved at room temperature. Fourier-transform infrared spectroscopy (FT-IR) measurement results suggest that the films deposited are primarily formed as one-dimensional chains of (âCF2â)n which are partially cross-linked. The cross-link density increases with increasing deposition temperature, which improves the thermal stability. However, the dielectric constant of the films increased abruptly above 300 ° C. The dielectric constant and leakage current at 1.0 MV/cm of the film deposited at room temperature were approximately 2.1 and 2.0 × 1 0 â 9 A/cm2, respectively.
- Subjects :
- Permittivity
Polytetrafluoroethylene
Analytical chemistry
General Physics and Astronomy
Infrared spectroscopy
Surfaces and Interfaces
General Chemistry
Dielectric
Condensed Matter Physics
Surfaces, Coatings and Films
chemistry.chemical_compound
chemistry
Thermal stability
Fluorocarbon
Thin film
Deposition (law)
Subjects
Details
- ISSN :
- 01694332
- Volume :
- 252
- Database :
- OpenAIRE
- Journal :
- Applied Surface Science
- Accession number :
- edsair.doi...........72410e4e8fc6231b84bb7095594d2c8b