Blue light emitting diode fabricated on a‐plane GaN film over r‐sapphire substrate and on a‐plane bulk GaN substrate

We studied the growth technique for the dislocation reduction in a-plane GaN grown by metal organic chemical vapour deposition (MOCVD) using AlInN buffer layer, high temperature atomic layer epitaxy, and trenched r-sapphire technique. By using these techniques, the crystal quality was much improved. We also fabricated blue light emitting diodes (LEDs) on a-plane GaN film over r-sapphire substrate and on a-plane bulk GaN substrate. The electroluminescence (EL) characteristics of the LED samples were examined, and we found that the EL near field pattern from homo-epitaxially grown a-GaN based LED was spatially uniform, although the pattern from the LED on r-sapphire substrate was not uniform. The output power at the wavelength of 430nm was 0.72mW at the 20mA injection current for the sample on a-plane bulk GaN. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)