Back to Search
Start Over
High efficient suspended coupler based on IME’s MPW platform with 193nm lithography
- Source :
- OFC
- Publication Year :
- 2017
- Publisher :
- OSA, 2017.
-
Abstract
- Benefiting from the new 193nm lithography, a narrow tip with width of 100 nm can be fabricated on IME's MPW platform. Based on the new capability, we optimized the suspended coupler and realized the state-of-the-art coupling loss less than −1.3 dB/facet with cleaved single mode fiber. A uniformity of 0.4 dB across wafers has also been confirmed, the best performance to our knowledge realized in public-available silicon photonics platform.
- Subjects :
- Engineering
Facet (geometry)
Coupling loss
Silicon photonics
business.industry
Single-mode optical fiber
Nanotechnology
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
010309 optics
0103 physical sciences
Coupling efficiency
Optoelectronics
Wafer
0210 nano-technology
business
Refractive index
Lithography
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- Optical Fiber Communication Conference
- Accession number :
- edsair.doi...........71cc6192317ed322c7fd8f5d5d6bcf90