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At-wavelength optical metrology development at the ALS

Authors :
Brian V. Smith
Wayne R. McKinney
Edward E. Domning
Tony Warwick
Sheng Sam Yuan
Iacopo Mochi
Valeriy V. Yashchuk
Richard Celestre
James Macdougall
Gregory Y. Morrison
Kenneth A. Goldberg
Source :
SPIE Proceedings.
Publication Year :
2010
Publisher :
SPIE, 2010.

Abstract

Nano-focusing and brightness preservation for ever brighter synchrotron radiation and free electron laser beamlines require surface slope tolerances of x-ray optics on the order of 100 nrad. While the accuracy of fabrication and ex situ metrology of x-ray mirrors has improved over time, beamline in situ performance of the optics is often limited by application specific factors such as x-ray beam heat loading, temperature drift, alignment, vibration, etc. In the present work, we discuss the recent results from the Advanced Light Source developing high accuracy, in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad accuracy surface slope measurements with reflecting x-ray optics. The techniques will ultimately allow closed-loop feedback systems to be implemented for x-ray nano-focusing. In addition, we present a dedicated metrology beamline endstation, applicable to a wide range of in situ metrology and test experiments. The design and performance of a bendable Kirkpatrick-Baez (KB) mirror with active temperature stabilization will also be presented. The mirror is currently used to study, refine, and optimize in situ mirror alignment, bending and metrology methods essential for nano-focusing application.

Details

ISSN :
0277786X
Database :
OpenAIRE
Journal :
SPIE Proceedings
Accession number :
edsair.doi...........718dc4589d3c87979c56992252caf6fe
Full Text :
https://doi.org/10.1117/12.859946