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Enhanced optical absorption in conformally grown MoS2 layers on SiO2/Si substrates with SiO2 nanopillars with a height of 50 nm
- Source :
- Nanoscale Advances. 3:710-715
- Publication Year :
- 2021
- Publisher :
- Royal Society of Chemistry (RSC), 2021.
-
Abstract
- The integration of transition metal dichalcogenide (TMDC) layers on nanostructures has attracted growing attention as a means to improve the physical properties of the ultrathin TMDC materials. In this work, the influence of SiO2 nanopillars (NPs) with a height of 50 nm on the optical characteristics of MoS2 layers is investigated. Using a metal organic chemical vapor deposition technique, a few layers of MoS2 were conformally grown on the NP-patterned SiO2/Si substrates without notable strain. The photoluminescence and Raman intensities of the MoS2 layers on the SiO2 NPs were larger than those observed from a flat SiO2 surface. For 100 nm-SiO2/Si wafers, the 50 nm-NP patterning enabled improved absorption in the MoS2 layers over the whole visible wavelength range. Optical simulations showed that a strong electric-field could be formed at the NP surface, which led to the enhanced absorption in the MoS2 layers. These results suggest a versatile strategy to realize high-efficiency TMDC-based optoelectronic devices.
- Subjects :
- Nanostructure
Photoluminescence
Materials science
business.industry
General Engineering
Bioengineering
02 engineering and technology
General Chemistry
Chemical vapor deposition
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
Atomic and Molecular Physics, and Optics
0104 chemical sciences
symbols.namesake
symbols
Optoelectronics
General Materials Science
Wafer
0210 nano-technology
Raman spectroscopy
business
Absorption (electromagnetic radiation)
Visible spectrum
Nanopillar
Subjects
Details
- ISSN :
- 25160230
- Volume :
- 3
- Database :
- OpenAIRE
- Journal :
- Nanoscale Advances
- Accession number :
- edsair.doi...........713848dda527814faaecea44ad47eb05