Process module control for low-κ dielectrics [CVD]

A process control system is composed of a variety of elements, from measurement technologies and techniques, through sampling strategies and analysis algorithms, to data-driven action plans. All components are required to ensure a stable process, however, effective control is founded upon a set of easily measured, yield-relevant parameters. In this work, we describe the use of a toolset and methodology to provide such parameters, and explore sampling and analysis components for the evaluation, development, and control of low-/spl kappa/ dielectric processes. In comparison to historically-employed interline dielectric (ILD) materials such as SiO/sub 2/, these low-/spl kappa/ materials and processes present significant integration, reliability, and stability concerns. A particularly sensitive parameter is the dielectric constant itself. Damage from high-power ultraviolet inspection techniques may also present challenges. As these relatively immature processes migrate into volume production, these same tools and parameters can be used to monitor the low-/spl kappa/ process module, improve baseline yield, and control excursions.