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Cryogenic behavior of Ultrashort gate AlGaAs/GaAs and pseudomorphic AlGaAs/InGaAs/GaAs HEMT's
- Source :
- Microelectronic Engineering. 19:861-864
- Publication Year :
- 1992
- Publisher :
- Elsevier BV, 1992.
-
Abstract
- High performance ?-doped double recess 0.1-0.4?m AlGaAs-GaAs S-HEMTs[1] and ?-doped single-recess 0.1-0.7?m AlGaAs/GaInAs/GaAs PM-HEMTs [2-3] are studied from 300K down to 60K. DC and 0.1-40GHz HF measurements followed by electric parameter extractions give extensive evolutions of HEMT electric parameters versus temperature T, gatelength 1 g . The results are interpreted in terms of the transition regime from diffusive to strong overshoot/near ballistic carrier transport under the gate. In the longer devices (1 g =0.4-0.7?m), the latter effects become important at low temperatures and bring frequency intrinsic performance improvement mainly in terms of an increase of maximum intrinsic transconductance g mo . The shorter devices (0.1-0.2?m) appear to be already well in the overshoot regime at 300K due to the high quality epitaxial layers, and their frequency performance improvement upon cooling comes mainly from a reduction of intrinsic capacitance C gsint . The relative increase of intrinsic unity current gain cut-off frequency f tint upon cooling rates at a similar value of 30-40% for all investigated gatelengths(0.1-0.7?m).
- Subjects :
- Materials science
business.industry
Transconductance
chemistry.chemical_element
High-electron-mobility transistor
Condensed Matter Physics
Epitaxy
Capacitance
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Gallium arsenide
Hafnium
chemistry.chemical_compound
chemistry
Overshoot (microwave communication)
Optoelectronics
Electrical and Electronic Engineering
business
Indium gallium arsenide
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 19
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........703fe905ac2e40c49abeeb279000cbe7