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Ru plasma etching process for thermally stable and low resistivity contacts
- Publication Year :
- 2021
Details
- Language :
- English
- Database :
- OpenAIRE
- Accession number :
- edsair.doi...........70097be27f0904d91ec796f18263d3cb
- Full Text :
- https://doi.org/10.13140/rg.2.2.21267.35361