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Reversible Low-Temperature Metal Node Distortion during Atomic Layer Deposition of Al2O3 and TiO2 on UiO-66-NH2 Metal–Organic Framework Crystal Surfaces

Authors :
Gregory N. Parsons
Paul C. Lemaire
Dennis T. Lee
Junjie Zhao
Source :
ACS Applied Materials & Interfaces. 9:22042-22054
Publication Year :
2017
Publisher :
American Chemical Society (ACS), 2017.

Abstract

Metal–organic frameworks (MOFs) are chemically functionalized micro- and mesoporous materials with high surface areas and are attractive for multiple applications including filtration, gas storage, and catalysis. Postsynthetic modification (PSM), via solution or vapor-based techniques, is a way to impart additional complexity and functionality into these materials. There is a desire to shift toward vapor-phase methods in order to ensure more controlled modification and more efficient reagent and solvent removal from the modified MOF material. In this work we explore how the metal precursors titanium tetrachloride (TiCl4) and trimethylaluminum (TMA), commonly used in atomic layer deposition, react with UiO-66-NH2 MOF. Using in situ quartz crystal microbalance (QCM) and Fourier transform infrared spectroscopy (FTIR) at 150 and 250 °C, we find that the ALD precursors react with μ3-OH hydroxyl and μ3-O bridging oxygen groups on Zr6 nodes, as well as oxygen from carboxylate linker groups. The reactions occur p...

Details

ISSN :
19448252 and 19448244
Volume :
9
Database :
OpenAIRE
Journal :
ACS Applied Materials & Interfaces
Accession number :
edsair.doi...........6e65453d54fb0c481369fe8e6d72acb1