Characterization of electron irradiation induced defects in δ-doped GaAs superlattice structures

We have studied the behaviour of electron irradiation induced defects in δ-doping GaAs superlattices, using capacitance-voltage and deep level transient spectroscopy. For the planar doping used (10 11 SSi cm −2 ) with a distance of 70 a between each plane, we observed a delocalization of the carriers, in agreement with theoretical calculation. The defects created by the irradiation are identical to the defects created in bulk GaAs. However, we observed in addition two new defects which are tentatively ascribed to a complex formed between the silicon dopant and the arsenic vacancy.