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Future device scaling - Beyond traditional CMOS
- Source :
- 2009 2nd International Workshop on Electron Devices and Semiconductor Technology.
- Publication Year :
- 2009
- Publisher :
- IEEE, 2009.
-
Abstract
- Device scaling is critical for continuing trend of more functionality in a chip. Traditional planar CMOS scaling is increasingly difficult due to limitations in processing and material properties, device structure and reliability. In this paper we will summarize recent advances in these areas, which will enable technology scaling as per Moore's law.
Details
- Database :
- OpenAIRE
- Journal :
- 2009 2nd International Workshop on Electron Devices and Semiconductor Technology
- Accession number :
- edsair.doi...........6d99e18ca44c7e4be262e70091e0c978
- Full Text :
- https://doi.org/10.1109/edst.2009.5166098