Surface photovoltage measurements in μc-Si:H: Manifestation of the bottom space charge region

We discuss results of surface photovoltage (U) measurements for d=10 μm thick layers of undoped hydrogenated microcrystalline silicon (μc-Si:H). By applying excitation with low energetic photons (down to 1.1 eV), i.e., with small absorption coefficient α and a large penetration depth α−1, a photovoltage peak appears on a curve U=U(α). This peak is located at α≳d−1 and its occurrence depends critically on the substrate material. The peak is present in a μc-Si:H film grown on p+ crystalline silicon (c-Si), on the other hand it is missing in the μc-Si:H samples grown on n+ c-Si or ZnO film. We present a mathematical model that enables us to link this peak to photocharge separation in the bottom space charge region at the interface μc-Si:H/substrate. Besides the magnitude of the ambipolar carrier diffusion length L, a parameter particularly critical for the occurrence of the peak turns out to be the ratio n of reverse saturation current densities of the two diodes representing surface and bottom space charge ...