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8.1: Invited Paper: Advanced Process and Structure for High Performance Oxide ThināFilm Transistors
- Source :
- SID Symposium Digest of Technical Papers. 50:71-74
- Publication Year :
- 2019
- Publisher :
- Wiley, 2019.
-
Abstract
- This work was supported by the industrial strategic technology development program funded by MKE/KEIT under grants 10079974 and Samsung research funding center for future technology through Samsung Electronics
Details
- ISSN :
- 21680159 and 0097966X
- Volume :
- 50
- Database :
- OpenAIRE
- Journal :
- SID Symposium Digest of Technical Papers
- Accession number :
- edsair.doi...........6c37bbde70e2a0b283bc4efa91b21148
- Full Text :
- https://doi.org/10.1002/sdtp.13391