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A wedge tunnel FET device for larger tunneling area and improved ON current

Authors :
Shree Prakash Tiwari
Astha Tyagi
Vipin Joshi
Source :
2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO).
Publication Year :
2015
Publisher :
IEEE, 2015.

Abstract

In an attempt to improve ON current and current ON/OFF ratio in tunnel field-effect Transistors (TFETs), a new wedge shaped structure for TFET named Wedge-TFET (WTFET) is proposed. This proposed device is a double gate structure, showing ∼3 times higher ON current compared to planar double gate TFET device working at supply voltage of 0.6 to 1.0 V. This increase is mainly due to increase in the tunneling area. In addition to increased current, W-TFET also shows high current ON/OFF ratio of the order ∼1012. The subthreshold swing values are slightly higher for W-TFET compared to our simulated DG-TFET, however, both of them fall in the range of 40 to 50 mV/dec. The W-TFET device with higher ON current and current ON/OFF ratio and with almost same area requirement can be a potential candidate for future low voltage applications.

Details

Database :
OpenAIRE
Journal :
2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO)
Accession number :
edsair.doi...........6c0122b2eb083b073c021b71bad3c731
Full Text :
https://doi.org/10.1109/nano.2015.7388763