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Effect of evaporation on surface morphology of epitaxial ZnO films during postdeposition annealing
- Source :
- Applied Surface Science. 241:179-182
- Publication Year :
- 2005
- Publisher :
- Elsevier BV, 2005.
-
Abstract
- We investigated the effect of evaporation on the surface morphology of c-oriented epitaxial ZnO (40 nm thick)/Al2O3(0 0 0 1) films during postdeposition annealing using real time synchrotron X-ray scattering and atomic force microscopy (AFM). We find that evaporation as well as grain coalescence play crucial roles on the surface morphology of the ZnO/Al2O3(0 0 0 1) films. Grain growth occurring in initial stage of annealing forms facets with higher surface energies than the (0 0 0 1) planes. By the preferential evaporation of the prism planes, the surface morphology of the ZnO film eventually evolves into 2D flat (0 0 0 1) surface at 800 °C, as confirmed by AFM. The real time measurement of the film thickness during annealing also supports the effect of the evaporation on the morphology. The evaporation rate is high in initial stage by the preferential evaporation from high energy facets but slows down after transition to the flat (0 0 0 1) surface.
- Subjects :
- Materials science
Scattering
business.industry
Atomic force microscopy
Annealing (metallurgy)
Thermal desorption
General Physics and Astronomy
Surfaces and Interfaces
General Chemistry
Condensed Matter Physics
Epitaxy
Synchrotron
Surfaces, Coatings and Films
law.invention
Grain growth
Optics
Chemical engineering
law
X-ray crystallography
business
Subjects
Details
- ISSN :
- 01694332
- Volume :
- 241
- Database :
- OpenAIRE
- Journal :
- Applied Surface Science
- Accession number :
- edsair.doi...........69b8fb110bca4040bee2dcece5afa5e2
- Full Text :
- https://doi.org/10.1016/j.apsusc.2004.09.087