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Effect of evaporation on surface morphology of epitaxial ZnO films during postdeposition annealing

Authors :
Jung Ho Je
Seok Joo Doh
C.C. Kim
J. Tashiro
Mamoru Yoshimoto
I.W. Kim
Source :
Applied Surface Science. 241:179-182
Publication Year :
2005
Publisher :
Elsevier BV, 2005.

Abstract

We investigated the effect of evaporation on the surface morphology of c-oriented epitaxial ZnO (40 nm thick)/Al2O3(0 0 0 1) films during postdeposition annealing using real time synchrotron X-ray scattering and atomic force microscopy (AFM). We find that evaporation as well as grain coalescence play crucial roles on the surface morphology of the ZnO/Al2O3(0 0 0 1) films. Grain growth occurring in initial stage of annealing forms facets with higher surface energies than the (0 0 0 1) planes. By the preferential evaporation of the prism planes, the surface morphology of the ZnO film eventually evolves into 2D flat (0 0 0 1) surface at 800 °C, as confirmed by AFM. The real time measurement of the film thickness during annealing also supports the effect of the evaporation on the morphology. The evaporation rate is high in initial stage by the preferential evaporation from high energy facets but slows down after transition to the flat (0 0 0 1) surface.

Details

ISSN :
01694332
Volume :
241
Database :
OpenAIRE
Journal :
Applied Surface Science
Accession number :
edsair.doi...........69b8fb110bca4040bee2dcece5afa5e2
Full Text :
https://doi.org/10.1016/j.apsusc.2004.09.087