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Amplitude-modulated electrostatic nanolithography in polymers based on atomic force microscopy
- Source :
- Applied Physics Letters. 83:4405-4407
- Publication Year :
- 2003
- Publisher :
- AIP Publishing, 2003.
-
Abstract
- Amplitude modulated electrostatic lithography using atomic force microscopy (AFM) on 20–50 nm thin polymer films is discussed. Electric bias of AFM tip increases the distance over which the surface influences the oscillation amplitude of an AFM cantilever, providing a process window to control tip-film separation. Arrays of nanodots, as small as 10–50 nm wide by 1–10 nm high are created via a localized Joule heating of a small fraction of polymer above the glass transition temperature, followed by electrostatic attraction of the polarized viscoelastic polymer melt toward the AFM tip in the strong (108–109 V/m) nonuniform electric field.
- Subjects :
- chemistry.chemical_classification
Materials science
Physics and Astronomy (miscellaneous)
business.industry
Electrostatic force microscope
Analytical chemistry
Polymer
Condensed Matter::Soft Condensed Matter
Nanolithography
chemistry
Electric field
Optoelectronics
Nanodot
business
Joule heating
Glass transition
Lithography
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 83
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........69249af2aaf66bc5a272920d747f3b8d