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New Water Soluble Negative Photoresists Containing N-Phenylamide Groups

Authors :
Kyu Ho Chae
Jin Koo Kang
Taihyun Chang
Source :
Journal of Photopolymer Science and Technology. 10:359-362
Publication Year :
1997
Publisher :
Technical Association of Photopolymers, Japan, 1997.

Subjects

Subjects :
Water soluble
Materials science
Polymers and Plastics
Organic Chemistry
Materials Chemistry
Organic chemistry

Details

ISSN :
13496336 and 09149244
Volume :
10
Database :
OpenAIRE
Journal :
Journal of Photopolymer Science and Technology
Accession number :
edsair.doi...........68450e9f241dcd44ffac3c8044eff957
Full Text :
https://doi.org/10.2494/photopolymer.10.359
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