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Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics
- Source :
- Nano Today. 8:265-289
- Publication Year :
- 2013
- Publisher :
- Elsevier BV, 2013.
-
Abstract
- Summary Plasma etching, a conventional technique in semiconductor industry, has exhibited great potentials in fabricating nanoscale patterns by taking advantage of its high anisotropic nature and fine controllability. Thus far, various gas mixtures and chemistries have been practically developed for etching a wide variety of materials, including semiconductors, oxides, glass, metals and polymers, to fabricate a broad range of vertical nanostructure arrays (VNAs). In this review paper, we will summarize the recent achievements in fabricating VNAs by plasma etching processes and their applications in biology, energy and electronics. The strategies in conjunction with microlithography or natural templates for fabricating various VNAs are outlined and the VNAs-based applications in diverse fields such as DNA sensors, biomimetic structures, solar cells, gas sensors, SERS, drug delivery, and field emission will be discussed in detail. Finally, the perspective of future studies is proposed. The widespread applications of the VNAs provide the conventional process of plasma etching a new opportunity to strut in the forefront of materials science.
- Subjects :
- chemistry.chemical_classification
Materials science
Plasma etching
Nanostructure
business.industry
Biomedical Engineering
Pharmaceutical Science
Bioengineering
Nanotechnology
Polymer
Field electron emission
Semiconductor
chemistry
Etching (microfabrication)
General Materials Science
Electronics
business
Nanoscopic scale
Biotechnology
Subjects
Details
- ISSN :
- 17480132
- Volume :
- 8
- Database :
- OpenAIRE
- Journal :
- Nano Today
- Accession number :
- edsair.doi...........67a0a0ca297e9fb35fae634a6e0ab566