Preparation of Ta-N and Ti-N Thin Films as a Capping Layer of CoFeB/MgO Magnetic Tunnel Junctions

Authors :: Soichiro Osaki
Atsushi Sugihara
Ryoichi Nakatani
Source :: Journal of the Japan Institute of Metals and Materials. 77:398-401
Publication Year :: 2013
Publisher :: Japan Institute of Metals, 2013.

Subjects :: Materials science
Metallurgy
Metals and Alloys
Tantalum
chemistry.chemical_element
Nitride
Condensed Matter Physics
Titanium nitride
chemistry.chemical_compound
Tunnel magnetoresistance
chemistry
Tantalum nitride
Mechanics of Materials
Materials Chemistry
Composite material
Thin film
Layer (electronics)

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