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Stochastic photons in the extreme ultra-violet lithography

Authors :
Sang-Kon Kim
Source :
International Conference on Extreme Ultraviolet Lithography 2021.
Publication Year :
2021
Publisher :
SPIE, 2021.

Subjects

Subjects :
Materials science
Photon
business.industry
Monte Carlo method
Ultra violet
Optoelectronics
business
Lithography
Secondary electrons

Details

Database :
OpenAIRE
Journal :
International Conference on Extreme Ultraviolet Lithography 2021
Accession number :
edsair.doi...........66c07085428091b8ead6d3b5b96508b1

Tools

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