FABRICATION AND CHARACTERIZATION OF SPUTTERED W/C MULTILAYER MIRROR FOR SOFT X-RAY

Authors :: Yin Gong-Jie
Shao Jian-Da
Fan Zheng-Xiu
Yi Kui
Yuan Li-Xiang
Source :: Acta Physica Sinica. 43:2015
Publication Year :: 1994
Publisher :: Acta Physica Sinica, Chinese Physical Society and Institute of Physics, Chinese Academy of Sciences, 1994.
Abstract: W/C multilayer mirror for 4.47nm had been fabricated by planar magnetron sputtering. Using small angle X-ray, transmission electon microscopy cross-section analysis and 4.47nm absolute reflectivity measurement techniques, the structrure and optical properties of this multilayer had been characterized.

Subjects :: Soft x ray
Fabrication
Materials science
Transmission (telecommunications)
business.industry
Sputtering
Microscopy
General Physics and Astronomy
Optoelectronics
Reflectivity measurement
business
Planar magnetron
Characterization (materials science)

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