Cite

AlGaN surfaces etched by CF4 plasma with and without the assistance of near-ultraviolet irradiation

MLA

Retsuo Kawakami, et al. “AlGaN Surfaces Etched by CF4 Plasma with and without the Assistance of Near-Ultraviolet Irradiation.” Vacuum, vol. 136, Feb. 2017, pp. 28–35. EBSCOhost, https://doi.org/10.1016/j.vacuum.2016.11.016.



APA

Retsuo Kawakami, Yoshitaka Nakano, Masahito Niibe, & Takashi Mukai. (2017). AlGaN surfaces etched by CF4 plasma with and without the assistance of near-ultraviolet irradiation. Vacuum, 136, 28–35. https://doi.org/10.1016/j.vacuum.2016.11.016



Chicago

Retsuo Kawakami, Yoshitaka Nakano, Masahito Niibe, and Takashi Mukai. 2017. “AlGaN Surfaces Etched by CF4 Plasma with and without the Assistance of Near-Ultraviolet Irradiation.” Vacuum 136 (February): 28–35. doi:10.1016/j.vacuum.2016.11.016.