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Comparative Investigation of Surge Current Capabilities of Si IGBT and SiC MOSFET for Pulsed Power Application
- Source :
- IEEE Transactions on Plasma Science. 46:2979-2984
- Publication Year :
- 2018
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2018.
-
Abstract
- The trend to move toward the solid-state and repetitive pulsed power supply requires the high-voltage, high-current, and high-speed semiconductor devices, which makes an insulated gate bipolar transistor (IGBT) preferred for this application. However, as a bipolar device, the IGBT is limited by the switching speed and switching loss. In this paper, the potential of silicon carbide (SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) for the pulsed power application is investigated. The surge current capabilities of 1.2-kV, 30-A commercial Si IGBT and SiC MOSFET are characterized and compared by the capacitor discharge experiment. In addition, the effects of various circuit parameters, including gate resistance, dc-link voltage, and dc-link capacitance, on the capacitor discharge process are investigated. It is found that the pulse current of SiC MOSFET is around two times of Si IGBT, which achieves good agreement with the datasheet. Using $di/dt$ to represent the discharging speed, the SiC MOSFET is 10 times faster than the Si IGBT. It is because the SiC MOSFET shows a lower ON-resistance in the saturation region resulted from the short-channel effect. This paper confirms the high-speed and high-current advantages of SiC MOSFET in the pulsed power application.
- Subjects :
- Nuclear and High Energy Physics
Materials science
business.industry
020208 electrical & electronic engineering
Transistor
02 engineering and technology
Semiconductor device
Insulated-gate bipolar transistor
Pulsed power
Condensed Matter Physics
01 natural sciences
Capacitance
010305 fluids & plasmas
law.invention
chemistry.chemical_compound
Capacitor
chemistry
law
0103 physical sciences
MOSFET
0202 electrical engineering, electronic engineering, information engineering
Silicon carbide
Optoelectronics
business
Subjects
Details
- ISSN :
- 19399375 and 00933813
- Volume :
- 46
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Plasma Science
- Accession number :
- edsair.doi...........658305da13ef1381a9a4615ba93f5b81