Etching process investigation of anodic oxide on Hg0.8Cd0.2Te

The electrolyte electroreflectance and reflectivity measurements were used to study the etching process and analyze the etching mechanism of etched anodic oxide film on HgCdTe. The observed shift of the energy peak in reflectance spectrum can be explained by the surface roughness. It was found that the oxide etched by HCl or HNO3 does not recover the original reflectivity spectra due to the surface characteristics, but lactic acid does. The multiple reflection theory was used to calculate the thickness and the etching rate of the oxide film. The etching characteristics of lactic acid have also been studied for different concentrations.