Application of Quantum Cascade Laser Absorption Spectroscopy for Correlation Studies in Plasma Etching Processes in the Semiconductor Industry

Authors :: J. H. van Helden
Stefan E. Schulz
Norbert Lang
B. Uhlig
Jürgen Röpcke
U. Macherius
Sven Zimmermann
Matthias Schaller
H. Zimmermann
Source :: High-Brightness Sources and Light-driven Interactions.
Publication Year :: 2018
Publisher :: OSA, 2018.
Abstract: Applying quantum cascade laser absorption spectroscopy a correlation could be demonstrated between the concentration of the etching products SiF4 and CO and the etching rate of ultra-low-k SiCOH in a low-pressure rf plasma containing CF4.

Subjects :: Materials science
Plasma etching
Absorption spectroscopy
business.industry
fungi
technology, industry, and agriculture
macromolecular substances
Plasma
Laser
law.invention
Semiconductor industry
stomatognathic system
law
Etching (microfabrication)
Molecule
Optoelectronics
Quantum cascade laser
business

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