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Deposition by magnetron sputtering and characterization of indium tin oxide thin films
- Source :
- Thin Solid Films. 515:6489-6492
- Publication Year :
- 2007
- Publisher :
- Elsevier BV, 2007.
-
Abstract
- In this work the properties of indium tin oxide (ITO) films deposed on glass substrates by magnetron sputtering technique in the temperature range below 200 °C are studied by various methods. The physical properties of ITO thin films have been investigated using optical transmittance, photoluminescence, atomic force microscopy, ellipsometry, Hall-effect and four point probe methods. It is established that properties of ITO layers depend drastically on the temperature and oxygen partial pressure during the deposition process and exhibit some peculiarities of the surface morphology. It is found that the band gap energy of this material varies in the energy range from 4.1 to 4.4 eV and depends on the growth conditions. It is suggested that local deviations from the stoichiometry and defects are the main physical reasons of Burstein–Moss shift of the optical band gap.
- Subjects :
- Photoluminescence
business.industry
Band gap
Chemistry
Metals and Alloys
Surfaces and Interfaces
Sputter deposition
Atmospheric temperature range
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Indium tin oxide
Optics
Ellipsometry
Physical vapor deposition
Materials Chemistry
Optoelectronics
Thin film
business
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 515
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........64088f8dce7103d7d62f64d985e79e58