Microstructure and Electrical Properties of III-As Gate Stacks with Amorphous Rare-Earth High-k Oxides

Authors :: Michael Yakimov
Vadim Tokranov
Serge Oktyabrsky
Maitri Warusawithana
R. Kambhampati
S. Koveshnikov
Darrell G. Schlom
Tassilo Heeg
Source :: Microscopy and Microanalysis. 16:1412-1413
Publication Year :: 2010
Publisher :: Oxford University Press (OUP), 2010.
Abstract: Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Subjects :: Materials science
Metallurgy
Rare earth
Gate stack
Microstructure
Instrumentation
High-κ dielectric
Amorphous solid

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