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Nano pattering by double expose hologram lithography and ZnO nanoscale photonic crystal
- Source :
- OECC/ACOFT 2008 - Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference on Optical Fibre Technology.
- Publication Year :
- 2008
- Publisher :
- IEEE, 2008.
-
Abstract
- We present spot and mesh patterns formed with same photo-resist by using ultra-violet laser holographic lithography. The ZnO nano crystal was deposited on patterned Si substrate by hydrothermal method.
Details
- Database :
- OpenAIRE
- Journal :
- OECC/ACOFT 2008 - Joint Conference of the Opto-Electronics and Communications Conference and the Australian Conference on Optical Fibre Technology
- Accession number :
- edsair.doi...........60c3b2365ab4ddb8931c93017c25e311