Size-controllable C60 nano-islands prepared on silicon wafers via spin-coating and the effect of annealing

Here, we demonstrate a simple route for preparing of C 60 nano-islands on a flat surface such as a silicon wafer by using spin-coating method. The size of C 60 nano-islands was controlled by varying C 60 concentrations and rotating speeds. Moreover, the molecular structure of the nano-islands changed depending on the annealing temperature. The homogenous formation of C 60 nano-islands was revealed by scanning electron microscopy and atomic force microscopy. A structural change occurred during annealing, and the Raman spectra indicated that this change was dependent on the annealing temperature.