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Hooge parameter of Ge grown for high-μ substrates of future sub-nm FETs

Authors :
J. Toyoshima
Munecazu Tacano
Hiroshi Ohya
Nobuhisa Tanuma
Toshimitsu Musha
T. Itatani
Source :
2013 22nd International Conference on Noise and Fluctuations (ICNF).
Publication Year :
2013
Publisher :
IEEE, 2013.

Abstract

The Hooge constant of p-Ge is shown consistent with the new quantum mechanical model, αH = α /λ the energy partition among coupled harmonic oscillation model in the equilibrium, exactly inversely proportional to the mean free path normalized by the lattice constant.

Details

Database :
OpenAIRE
Journal :
2013 22nd International Conference on Noise and Fluctuations (ICNF)
Accession number :
edsair.doi...........5d8eeaab7c50055af6e8a6bf3a4f421f
Full Text :
https://doi.org/10.1109/icnf.2013.6578964