Large area fabrication of high aspect ratio nano‐cylinders on micro‐pillars based on a colloidal crystal mask

The combination of microstructures and nanostructures has broad application prospects. However, most existing methods are oriented to fabricating microstructures and nanostructures separately, and the fabrication of nanostructures on a microstructured surface at the wafer level is rarely studied. In this work, a new method of fabricating large-area high aspect ratio nano-cylinders on micro-pillars based on a colloidal crystal mask is proposed. An experimental device for stripping and draining was designed to create a polystyrene colloidal crystal mask. Together with reactive-ion etching and metal-assisted chemical etching, high aspect ratio nano-cylinders on micro-pillars with controllable size were obtained on a 4-inch silicon wafer. Wetting tests were performed on four groups of fabricated structures of different sizes, and the results showed that all samples were superhydrophobic. Thus, a method for fabricating uniform, size-controllable, large-area high aspect ratio nano-cylinders on micro-pillars with great potential as a superhydrophobic engineering material is proposed.