Atmospheric pressure spatial ALD of Al2O3 thin films for flexible PEALD IGZO TFT application

Subjects

Subjects :

Process Chemistry and Technology
Materials Chemistry
Ceramics and Composites
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

Details

ISSN :

02728842

Volume :

48

Database :

OpenAIRE

Journal :

Ceramics International

Accession number :

edsair.doi...........5c22eb7b261a94117ab5e178731f5880

Full Text :

https://doi.org/10.1016/j.ceramint.2022.03.157